In finFETs, there are four parts that require patterning—fin; gate; metal; and via ... LELE provides a 30% reduction in pitch. 7nm may require triple patterning or LELELE. The other main schemes are ...

Learn about the challenges of IP design and implementation for 7nm FinFETs. Along with the performance and area benefits that the node brings, designers must understand the significant technical ...

Dolphin offers an extensive array of Standard Cell libraries that have been methodically tested and verified in silicon for each process technology supported. More than 5000 fully customizable cells ...