An LPP EUV source comprises a CO2 light source that is applied to tiny tin droplets around 30 microns in diameter in a ...

“After lithography, a selective organic mandrel deposition was performed in an etch chamber, growing the EUV photoresist to a height that is compatible with multi patterning. After the mandrel was ...

EUV light is so easily absorbed, though, that even in a vacuum-sealed chamber with ultra-specialised mirrors, each reflection saps 30% of the light’s energy. By the time the photons reach the ...

For example, oil and grease cannot be used in the machining of any part or component within the vacuum chamber, even down to the smallest screw. There is also the question of how to generate EUV ...