tom's Hardware on MSN6mon
China's SMEE files patent for an EUV chipmaking tool — tool aims to break the shackles of ASML export restrictions
An LPP EUV source comprises a CO2 light source that is applied to tiny tin droplets around 30 microns in diameter in a ...
Semiconductor Engineering4y
Manufacturing Bits: March 8
“After lithography, a selective organic mandrel deposition was performed in an etch chamber, growing the EUV photoresist to a height that is compatible with multi patterning. After the mandrel was ...
Nature1y
Lithography gets extreme
For example, oil and grease cannot be used in the machining of any part or component within the vacuum chamber, even down to the smallest screw. There is also the question of how to generate EUV ...