Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

For scanner manufacturers ... each mirror can only reflect a theoretical maximum of 72% of the incident EUV light — the rest is absorbed by the mirror. To get close to this theoretical level ...

The most advanced scanners use 193nm wavelength light ... Instead of using an STM, Paul Scherrer Institute performed the same process using EUV. For this, EUV light exposed a hydrogen-terminated ...

where she familiarized herself with the EUV machine’s parts: the scanner (the part with the mirrors that focus the light onto ...

The result is a high-temperature tin plasma that radiates light at 13.5 nm. A large EUV mirror collects the emission and directs it into a scanner where it passes through a photomask, before being ...

Individual EUV photons have a lot of energy, but there aren’t very many of them. Feature roughness depends on the interaction ...

The AIRES ® (Actinic Image REview System) microscope captures and characterizes photomask defects, supporting both EUV scanner emulation mode as well as a variety of enhanced imaging modes that ...

We develop modules, research equipment, and strategies for the contamination control of EUV lithography scanners and materials and have been ... and setups to research the effect of EUV light and ...