Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Developing EUV lithography, however ... a single fingerprint on the wall of the vacuum chamber could put the whole system out of specification. These practices must be applied throughout the ...

In an EUV tool, the plasma source ... is mostly confined to the source chamber, which is separated from the photomask. The light is carried by a set of lithography mirrors that are susceptible ...

A pilot line will begin at Rapidus’ IIM-1 in April 2025. A single-wafer process will be introduced for all manufacturing ...

A new technical paper titled “Sensitivity and contrast of indium nitrate hydrate resist evaluated by low-energy electron beam ...

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 nanometers. For years, Dutch company ASML has maintained a global monopoly on ...

New approaches in the development of extreme ultraviolet (EUV) lithography are being pioneered by Chinese scientists, paving the way for the mass production of advanced semiconductor chips as ...

Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been ...

Advanced techniques like extreme ultraviolet (EUV) lithography are being developed to overcome these limitations and reduce feature sizes further.

Currently, Dutch company ASML Holding NV (AS:ASML) is the only major manufacturer of EUV lithography equipment, and under current U.S. sanctions, is prohibited from selling the technology to ...

Currently, Dutch company ASML Holding NV (AS:ASML) is the only major manufacturer of EUV lithography equipment, and under current U.S. sanctions, is prohibited from selling the technology to Chinese ...