Pat Gelsinger is back in the semiconductor game with xLight, a company that plans to make an EUV light source using a ...

A typical optical system for lithography contains 11 components, so the total throughput of EUV light is only around 2%, which means a bright light source is needed. Difficulties in the ...

Chinese electronics giant Huawei is testing elements for an extreme ultraviolet (EUV) lithography machine at its Dongguan ...

The light projects the pattern onto a photoresist ... primary hypothesis that the energy efficiency of existing EUV lithography sources for semiconductor production can be improved with technology ...

Developing EUV lithography, however ... the entire optical path from the light source to the wafer must be in a near-vacuum (Fig. 2). To maintain this throughout the lifetime of the scanner ...

ASML is the sole producer of cutting-edge EUV lithography machines for advanced 3nm chip manufacturing. How secure is that ...

After a period of delays, EUV pellicles are emerging and becoming a requirement in high-volume production of critical chips. At the same time, the pellicle landscape for extreme ultraviolet (EUV) ...

such as argon plasma laser sources that emit radiation at 46.9 nm. FZ Jülich is researching how this radiation can be used for EUV interference lithography. ASML's EUV imagesetter Twinscan NXE ...

Source: Chris Mack, Fractilia This process is used for traditional optical lithography as well as EUV ... Paul Scherrer Institute performed the same process using EUV. For this, EUV light exposed a ...

Export bans on equipment are easier to put in place, so lithography machines have been targeted for controls. The light source on EUV depends exclusively on US-based Cymer; therefore, the machines ...

We are specialists in contamination control research. We develop instrumentation and strategies for applications with the most challenging requirements in the High Tech Industry, including EUV ...