Multiple patterning is an advanced lithographic technique now being used by Intel (NASDAQ:INTC) and others in leading edge semiconductor manufacturing.As is well known, semiconductor manufacturers ...

Most foundries, even those that also use EUV on some layers, employ multi-patterning as a way to accurately print features in greater density onto the growing number of layers of the silicon. Figure 1 ...

Three-dimensional (3D) protein-patterned scaffolds provide a more biomimetic environment for cell culture than traditional two-dimensional surfaces, but simultaneous 3D protein patterning has ...

Continued scaling-down of lithographic-pattern feature sizes has brought templated self-assembly of block copolymers (BCPs) into the forefront of nanofabrication research. Technologies now exist ...

The latest generation of Lam's market-leading conductor etch products, the 2300 Kiyo F Series addresses patterning variability by using its Hydra technology to correct for critical dimension (CD ...

Release Summary. Nikon releases the Streamlign platform-based NSR-S622D ArF immersion scanner to deliver world-class overlay and ultra-high productivity for the most demanding multiple patterning ...

Centura ® Tetra(TM) Z system is industry`s first photomask etch solution for quadruple patterning at 10nm and beyond World-class photomask etch performance and defect control meet advanced ...