Plasma ALD methods depend heavily on ions. Ions can enhance the quality of films, especially when used with nitrides and at lower deposition temperatures. But some substrates and interfaces could be ...

Researchers investigated different compositions of tin sulfides to find the ideal material for devices that harness solar ...

A recent study published in Advanced Energy and Sustainability Research examined the fabrication of nanoporous helium-silicon thin films using a plasma-assisted co-deposition process, offering a ...

The Cobra ® ICP plasma source generates high-density reactive species ... high-quality films from room temperature to 400 °C with high-density plasmas at low deposition temperatures and pressures. The ...

Pulsed laser deposition (PLD) involves a laser ablation procedure, where a laser pulse interacts with a material surface to induce the formation of a plasma plume that expands away from the surface.

Additionally, PECVD can enhance the deposition rate and modify the film properties by controlling the plasma parameters. In this process, the energy required for the chemical reaction is provided by ...

The background gas in the PLD chamber can be used to control the plasma plume dynamics and the stoichiometry ... The gas pressure also influences the mean free path of the ablated species and the ...

Jolywood claims to have achieved a power conversion efficiency of 26.7% for an n-type M10 solar cell based on TOPCon technology. The China Academy of Metrology and Science has certified the result ...