First, because EUV light is absorbed by air (in contrast with 193 nm light), the entire optical system, from source to wafer ... speculative and at an early stage of research.

Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Few would expect the future of artificial intelligence to depend on Eindhoven, a quiet Dutch town. Yet just beyond its ...

The company uses these systems for research and development purposes, and so far, Intel has processed tens of thousands of wafers using them. Intel installed and started using two High-NA EUV ...

Rapidus has successfully begun installing ASML's Twinscan NXE:3800E EUV lithography system ... high-power light source, a new wafer handler, faster wafer stages, and other components needed ...

Aether® significantly enhances EUV sensitivity and the resolution of each wafer pass, enabling the most challenging patterns to better adhere to the wafer and improving performance and yield.

Huawei, SMIC reportedly advancing LDP lithography, eye 3Q25 trial, 2026 rollout China is making significant strides in ...

is proud to announce its latest line of ultra-precision silicon wafers designed to meet the rigorous demands of Extreme Ultraviolet (EUV) lithography. These state-of-the-art substrates are ...

Intel struggled with the reliability of those previous EUV models in the initial stages of production ... "We're getting wafers out at a consistent rate, and that's a huge boon to the platform ...

ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel access to leading-edge equipment.

At a conference in San Jose, California, Intel senior principal engineer Steve Carson said Intel has produced 30,000 wafers ... of those previous EUV models in the initial stages of production.