IMS recently launched a multi-beam mask writer, which is targeted for the 7nm node. Is NuFlare behind in the multi-beam mask writer market? Yamada: We are behind. But we will catch up with them by the ...

We need more computing power. SE: In 2018, Samsung and TSMC inserted EUV lithography for the 7nm process node. Now, using EUV, chipmakers are producing chips at 5nm. Nonetheless, we keep hearing about ...

This paper will discuss the Metal DRC violations (7nm Technology) generally seen at the block level ... with the name CM1B.O.*. It is due to the overlapping of CutMetalM1 of Mask 2 or (Mask B) and the ...