In the middle picture, you see a pattern that has been generated by a single pass High-NA EUV and a pitch that ... developing gate-all-around (GAA) transistors, a first for Intel.

In the heart of the Arizona desert, some of the country's most advanced semiconductor chips are being manufactured at Taiwan ...

This means that as process nodes shrink, more transistors can fit inside a chip making the component more powerful and energy-efficient. EUV lithography machines are important in this regard because ...

Determining the ideal etch conditions to remove rough areas of the line and space resist pattern after EUV exposure.

TSMC's SVP Kevin Zhang said during the recent North American Technology Symposium: "TSMC will not be using high-NA EUV lithography to pattern A14 chips, manufacturing of which is scheduled to ...

China cracks EUV light source barrier, builds new experimental platform Staff reporter, Taipei; Levi Li, DIGITIMES Asia Wednesday 30 April 2025 0 Credit: Chinese Journal of Lasers ...

Chinese researchers have cracked a barrier to the home-grown production of advanced chips by building an extreme ultraviolet (EUV) light source platform that operates at internationally ...

These are the top-read DIGITIMES Asia stories from the week of April 28 – May 4. From China's EUV light source milestone and Intel's turnaround push to Nvidia's evolving China strategy and TSMC ...