Chemical analysis was performed by LA-ICP-MS using an Agilent 7500a and 7900 ICP-MS instrument combined with a GeoLas 193 nm laser. The carrier gas used in the laser ablation unit was He with a flow ...

Abstract: We developed a nanoimprint lithography (NIL) technology including NIL system, template and resist process for half pitch (hp) 14 nm direct pattering. The latest NIL system NZ2C shows the mix ...

It was once thought that old backend foundry lithography steppers could be used to address the new packaging requirements; which was true whilst the substrates remained in the traditional 300mm ...