Novellus - Concept One CVD Dielectric Deposition System: The Benchmark in Semiconductor Production Dependability and process flexibility

Introduction: The Novellus Concept One is a plasma-enhanced chemical vapor deposition system (PECVD), which deposits various dielectric films on silicon wafers. We have the capability to deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. Dual-frequency RF plasma and multiple-station continuous

for Novellus PECVD Equipment • Proprietary polishing procedure for superb performance • Chemically inert synthetic ruby orifices for consistent processing • Process flexibility by customizing configurations Highly Engineered Precise Mechanical Crimp

The Concept1 is a PECVD tool for depositing dielectric films on 6" wafers. It allows CMOS compatible metals, making it suitable for backend processes. It is capable of thick films in excess of 1 um, and the system deposits on multiple wafers in parallel in a batch-type reactor.

Refractive index – why is it important in PECVD? Refractive index is a good indicator of film composition, i.e. Si:N ratio or Si:O ratio. It can be easily measured by ellipsometer or prism coupler, allowing rapid evaluation of film composition (and unifomrity of composition).

Deptec’s Novellus C1 Upgrade Kit is designed to deliver increased efficiency and optimal performance for legacy chemical vapor deposition equipment. Speed: Modernizations completed in under a month. Affordability: Budget-friendly options for used and refurbished Novellus CVD Concept One systems.

Novellus Concept One Dielectric CVD System. Novellus was among the first to be successful with this new Concept specification.

Concept One CVD DIELECTRIC SYSTEM The Be11chmark i11 Production Dependability and Process Flexibility TI1e Conccpl One is 1he culmina1ion of a rcvolu1ionary de.1igu conce1~ and a scren-year process of cominuous i111prove1nent driven by the produc1ion experience of an installed ba.~ of 600 systems.The uni(1uc rnultisuuion.

机型：novellus c1 pecvd. 制造商：novellus. 设备描述：sio2, sin 淀积. 晶圆尺寸：6"/8" 数量：8台. 当前状态：在售

机型：novellus c1 pecvd. 制造商：novellus. 设备描述：sio2, sin 淀积. 晶圆尺寸：6"/8" 数量：8台. 当前状态：在售